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首页> 外文期刊>Applied Physics Letters >Raman spectroscopy of sputtered AlN films: E_2(high) biaxial strain dependence
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Raman spectroscopy of sputtered AlN films: E_2(high) biaxial strain dependence

机译:溅射AlN薄膜的拉曼光谱:E_2(高)双轴应变依赖性

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Sputtered [0001] AlN films with directly measured biaxial strain have been investigated by Raman spectroscopy to determine the strain dependence of the zone-center mode frequencies. The E_2(high) feature near 655 cm~(-1) is found to vary linearly with stress, and we determine the strain derivative of the line as -2.9 ± 0.3 cm~(-1)/GPa, confirming the lowest previously reported derivative and a factor of 2 smaller than the largest. The result is 13% larger than has been predicted by ab initio calculations. The other zone-center lines accessible under normally incident geometry from a c-axis film are shown to be unsuitable as strain gauges.
机译:已经通过拉曼光谱法研究了具有直接测量的双轴应变的溅射的[0001] AlN膜,以确定区域中心模式频率的应变依赖性。发现655 cm〜(-1)附近的E_2(高)特征随应力线性变化,我们确定该线的应变导数为-2.9±0.3 cm〜(-1)/ GPa,从而确认了先前报道的最低值导数,并且比最大小2倍。结果比从头算的预测结果大13%。在垂直入射的几何形状下可从c轴薄膜访问的其他区域中心线显示为不适合用作应变仪。

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