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Carrier-induced ferromagnetism in Ge(Mn,Fe) magnetic semiconductor thin-film structures

机译:Ge(Mn,Fe)磁性半导体薄膜结构中的载流子感应铁磁性

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We report on the carrier-induced ferromagnetism in Ge(Mn,Fe) magnetic semiconductor insulating-type thin-film structures prepared using sequential deposition at T_g=520 K with subsequent annealing at T_g. In the resulting films Mn and Fe are diffused in the Ge matrix without compromising the epitaxial structure. The anomalous Hall effect serves as a manifestation of the carrier-induced magnetism, with p-type conductivity and the Curie temperature T_C=209 K. The additional doping with Fe stabilizes epitaxial growth and carrier-mediated magnetism at levels of magnetic doping exceeding 10%. We conclude that indirect ferromagnetic exchange is mediated by localized holes with concentration n~10~(20) cm~(-3) and mobility μ~ 10 cm~2/(V s).
机译:我们报告了在T_g = 520 K顺序沉积并随后在T_g进行退火制备的Ge(Mn,Fe)磁性半导体绝缘型薄膜结构中的载流子感应铁磁性。在所得的膜中,Mn和Fe在Ge基体中扩散而不损害外延结构。霍尔效应的异常表现为载流子感应磁性的表现,p型电导率和居里温度T_C = 209K。额外的Fe掺杂使外延生长和载流子介导的磁性稳定在磁掺杂水平超过10%时。我们得出结论,间接铁磁交换是由浓度为n〜10〜(20)cm〜(-3)和迁移率μ〜10 cm〜2 /(V s)的局部空穴介导的。

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