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Electrical conduction of Ge nanodot arrays formed on an oxidized Si surface

机译:在氧化的Si表面上形成的Ge纳米点阵列的导电

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摘要

Carrier transport mechanism on Ge nanodot arrays formed on SiO_2 monolayer covering over the Si surface is investigated by microscopic four-point-probe measurements combined with core-level photoemission spectroscopy and scanning tunneling microscopy. Different conduction natures are found depending on whether or not the nanodots and the substrate are directly connected by subnanometer-sized voids penetrating the SiO_2 layer. In the presence of the voids, conductivity is regulated by the dot-size through quantum-size effect.
机译:通过显微四点探针测量结合核能级光发射光谱和扫描隧道显微镜研究了在Si表面SiO_2单层覆盖的Ge纳米点阵列上形成载流子的机理。根据纳米点和衬底是否通过穿透SiO_2层的亚纳米级空隙直接连接,发现了不同的导电特性。在存在空隙的情况下,电导率通过量子尺寸效应由点尺寸调节。

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