Organic-based distributed feedback lasers by direct electron-beam lithography on conjugated polymers

摘要

The authors demonstrate direct electron-beam writing on conjugated polymers as patterning route to realize plastic optoelectronic devices. Lithography was carried out by a 20 kV electron beam dose in the range of 0-360 μC/cm~2, with no need for masking or development/etching processes. The features could be employed for the fabrication of polymer distributed feedback lasers, exhibiting optically pumped lasing in the range of 607-620 nm, with a spectral line width around 1 nm and a threshold excitation fluence of 34 μJ/cm~2.