Pattern formation in martensitic thin films

摘要

Pattern formation in martensitic materials refers to the accommodation problem of how to mix martensitic variants coherently to minimize the strain energy. A framework motivated by energy-minimizing multirank laminated patterns is proposed to study this problem in martensitic films. It is found that the interfaces between the variants of martensite can be quite different in thin films than in bulk materials, and they typically have a simpler structure. Various intriguing and fascinating self-accommodation patterns are predicted for martensitic thin films with different orientations. The results are in good agreement with the Bhattacharya-James thin-film theory [K. Bhattacharya and R. D. James, J. Mech. Phys. Solids 47, 531 (1999)] as well as with experimental observations.