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Quantum-confinement effect in individual Ge_(1-x)Sn_x quantum dots on Si(111) substrates covered with ultrathin SiO_2 films using scanning tunneling spectroscopy

机译:使用扫描隧道光谱法研究覆盖有超薄SiO_2薄膜的Si(111)衬底上单个Ge_(1-x)Sn_x量子点中的量子约束效应

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摘要

The authors observed a quantum-confinement effect in individual Ge_(1-x)Sn_x quantum dots (QDs) on Si (111) substrates covered with ultrathin SiO_2 films using scanning tunneling spectroscopy at room temperature. The quantum-confinement effect was featured by an increase in the energy band gap of ~1.5 eV with a decrease in QD diameter from 35 to 4 nm. The peaks for quantum levels of QDs became broader with a decrease in the height-diameter aspect ratio of QDs, demonstrating the gradual emergence of two dimensionality in density of states of quasi zero-dimensional QDs with the QD flattening.
机译:作者在室温下使用扫描隧道光谱法观察了覆盖有超薄SiO_2薄膜的Si(111)衬底上单个Ge_(1-x)Sn_x量子点(QDs)的量子约束效应。量子约束效应的特征是,能带隙增加了约1.5 eV,量子点直径从35 nm减小到4 nm。随着QD的高径纵横比的减小,QD的量子能级的峰变得更宽,这表明随着QD趋于平坦,准零维QD的状态密度逐渐出现二维。

著录项

  • 来源
    《Applied Physics Letters》 |2007年第1期|13109.1-13109.3|共3页
  • 作者单位

    Quantum-Phase Electronics Center, Department of Applied Physics, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;计量学;
  • 关键词

  • 入库时间 2022-08-18 03:21:12

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