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Cubic-to-monoclinic phase transition during the epitaxial growth of crystalline Gd_2O_3 films on Ge(001) substrates

机译:在Ge(001)衬底上外延生长Gd_2O_3晶体薄膜时立方到单斜相转变

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摘要

Thin crystalline films of Gd_2O_3 are grown on an atomically flat Ge(001) surface by molecular beam epitaxy and are characterized in situ by reflection high energy electron diffraction and x-ray photoelectron spectroscopy, and ex situ by x-ray diffraction (XRD), atomic force microscopy (AFM), and transmission electron microscopy. The first stage of the growth corresponds to a cubic (110) structure, with two equiprobable, 90° rotated, in-plane domains. Increasing the thickness of the films, a phase transition from cubic (110) to monoclinic (100) oriented crystallites is observed which keeps the in-plane domain rotation, as evidenced by XRD and AFM.
机译:Gd_2O_3晶体薄膜通过分子束外延生长在原子平坦的Ge(001)表面上,并通过反射高能电子衍射和X射线光电子能谱进行原位表征,并通过X射线衍射(XRD)进行原位表征,原子力显微镜(AFM)和透射电子显微镜。生长的第一阶段对应于立方(110)结构,具有两个等概率的90°旋转平面内畴。 XRD和AFM证明,随着薄膜厚度的增加,从立方(110)取向到单斜晶(100)取向的微晶会发生相变,并保持面内畴旋转。

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