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Spatial variations of doping and lifetime in epitaxial laterally overgrown GaN

机译:外延横向生长的GaN中掺杂和寿命的空间变化

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Spatial variations of donor concentration and diffusion length/lifetime were studied for epitaxial laterally overgrown undoped n-GaN samples by electron beam induced current (EBIC) and microcathodoluminescence (MCL). The dependence of the EBIC signal collection efficiency on the probing beam accelerating voltage shows that the local electron concentration is three times lower and the local lifetime about twice as high in the laterally overgrown regions compared to the regions grown in the SiO_2 mask windows. Band edge MCL profiling shows that the lifetime difference could be an order of magnitude higher. EBIC scans along the SiO_2 stripes in the low dislocation density overgrown regions show long propagation distances of holes in the quasineutral part of the structure, explained by the existence of a potential profile forming a trough for transport of holes while spatially separating nonequilibrium carriers.
机译:通过电子束感应电流(EBIC)和微阴极发光(MCL)研究了外延横向生长的未掺杂n-GaN样品的施主浓度和扩散长度/寿命的空间变化。 EBIC信号收集效率对探测束加速电压的依赖性表明,与在SiO_2掩模窗口中生长的区域相比,在横向过度生长的区域中,局部电子浓度低三倍,并且局部寿命大约高两倍。频带边缘MCL分析表明,寿命差异可能会高一个数量级。在低位错密度过度生长区域中沿着SiO_2条纹进行的EBIC扫描显示,在结构的准中性部分中,空穴的传播距离较长,这可能是由于存在形成势能波谷而在空间上隔开非平衡载流子而形成了一个波谷。

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