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首页> 外文期刊>Applied Physics Letters >Characterization of the Schottky barrier in SrRuO_3/Nb:SrTiO_3 junctions
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Characterization of the Schottky barrier in SrRuO_3/Nb:SrTiO_3 junctions

机译:SrRuO_3 / Nb:SrTiO_3结中的肖特基势垒的表征

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摘要

Internal photoemission spectroscopy was used to determine the Schottky barrier height in rectifying SrRuO_3/Nb-doped SrTiO_3 junctions for 0.01 and 0.5 wt % Nb concentrations. Good agreement was obtained with the barrier height deduced from capacitance-voltage measurements, provided that a model of the nonlinear permittivity of SrTiO_3 was incorporated in extrapolating the built-in potential, particularly for high Nb concentrations. Given the generic polarizability of perovskites under internal/external electric fields, internal photoemission provides a valuable independent probe of the interface electronic structure.
机译:内部光发射光谱法用于确定在0.01和0.5 wt%Nb浓度下整流SrRuO_3 / Nb掺杂的SrTiO_3结时的肖特基势垒高度。如果将SrTiO_3的非线性介电常数模型用于推断内置电势,特别是对于高Nb浓度,则可以通过电容-电压测量得出的势垒高度获得良好的一致性。鉴于钙钛矿在内部/外部电场下的一般极化率,内部光发射为界面电子结构提供了有价值的独立探针。

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