Nanostructured Multilayer Graded-index Antireflection Coating For Si Solar Cells With Broadband And Omnidirectional Characteristics

摘要

Design, fabrication, and characterization of a broadband, omnidirectional, graded-index antireflection (AR) coating made using nanostructured low-refractive-index (n= 1.05-1.40) silica deposited by oblique-angle deposition are reported. Averaged over wavelength range from 400 to 1100 nm and 0°-90° angle of incidence, polished Si reflects ～37% of incident radiation. The reflection losses are reduced to only 5.9% by applying a three-layer graded-index AR coating to Si. Our experimental results are in excellent agreement with theoretical calculations. The AR coatings reported here can be optimized for photovoltaic cells made of any type of material.