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Epitaxial growth of MgO and Fe/MgO/Fe magnetic tunnel junctions on (100)-Si by molecular beam epitaxy

机译:通过分子束外延在(100)-Si上外延生长MgO和Fe / MgO / Fe磁性隧道结

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摘要

Epitaxial growth of MgO barrier on Si is of technological importance due to the symmetry filtering effect of the MgO barrier in conjunction with bcc-ferromagnets. We study the epitaxial growth of MgO on (100)-Si by molecular beam epitaxy. MgO matches Si with 4:3 cell ratio, which renders Fe to be 45° rotated relative to Si, in sharp contrast to the direct epitaxial growth of Fe on Si. The compressive strains from Si lead to the formation of small angle grain boundaries in MgO below 5 nm, and also affect the transport characteristics of Fe/MgO/Fe magnetic tunnel junctions formed on top.
机译:MgO势垒在Si上的外延生长具有重要的技术意义,这是因为MgO势垒与bcc-铁磁体的对称过滤作用。我们通过分子束外延研究了MgO在(100)-Si上的外延生长。 MgO以4:3的晶胞比匹配Si,这使Fe相对于Si旋转了45°,这与Fe在Si上直接外延生长形成鲜明的对比。 Si的压缩应变导致在5 nm以下的MgO中形成小角度晶界,并且还影响在顶部形成的Fe / MgO / Fe磁性隧道结的传输特性。

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