Application of ion scattering spectroscopy to measurement of surface potential of MgO thin film under ion irradiation

摘要

An experimental approach was proposed for the measurement of the surface potential (SP) induced on an insulator surface during ion irradiation by ion scattering spectroscopy (ISS). The resultant ISS spectra obtained for a MgO thin film of 600 nm thickness on a Si substrate under 950 eV He~+ irradiation revealed that the surface is positively charged by approximately 230 V. In addition, the onset energy of a secondary ion peak indicated a SP of approximately 205 V. The present results confirmed that ISS is an effective technique for measuring the SP during ion irradiation.