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Comparison of the magnetic properties of GeMn thin films through Mn L-edge x-ray absorption

机译:通过Mn L边x射线吸收比较GeMn薄膜的磁性

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摘要

X-ray absorption spectroscopy of epitaxial GeMn thin films reveals an experimentally indistinguishable electronic configuration of Mn atoms incorporated in Ge_(1-x)Mn_x nanoclusters and in precipitates of the intermetallic compound Mn_5Ge_3, respectively. However, the average magnetic response of thin films containing Ge_(1-x)Mn_x nanoclusters is lower than the response of films containing Mn_5Ge_3 precipitates. This reduced magnetic response of Ge_(1-x)Mn_x nanoclusters is explained in terms of a fraction of Mn atoms being magnetically inactive due to antiferromagnetic coupling or the presence of structural disorder. A determination of the role of magnetically inactive Mn atoms in the self-assembly of the thermodynamically metastable Ge_(1-x)Mn_x nanoclusters seems to be an essential ingredient for an enhanced control of this promising high Curie temperature magnetic semiconductor.
机译:外延GeMn薄膜的X射线吸收光谱显示,分别嵌入Ge_(1-x)Mn_x纳米团簇和金属间化合物Mn_5Ge_3的沉淀物中的Mn原子在实验上无法区分。然而,包含Ge_(1-x)Mn_x纳米团簇的薄膜的平均磁响应低于包含Mn_5Ge_3析出物的薄膜的响应。 Ge_(1-x)Mn_x纳米团簇的这种降低的磁响应是根据部分Mn原子由于反铁磁耦合或存在结构无序而无磁性而解释的。确定在热力学上稳定的Ge_(1-x)Mn_x纳米团簇的自组装中无磁性的Mn原子的作用似乎是增强控制这种有前途的高居里温度磁性半导体的必要成分。

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  • 来源
    《Applied Physicsletters》 |2009年第15期|151911.1-151911.3|共3页
  • 作者单位

    Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching, Germany;

    Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching, Germany;

    Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:19:59

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