机译:通过Mn L边x射线吸收比较GeMn薄膜的磁性
Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching, Germany;
Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;
Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching, Germany;
Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;
Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;
Walter Schottky Institut, Technische Universitaet Muenchen, Am Coulombwall 3, D-85748 Garching, Germany;
机译:Si(001)衬底上生长的GeMn薄膜的Mn分布行为和磁性
机译:L边X射线吸收光谱法研究厚度对铁和镍薄膜电子结构的依赖性
机译:L边缘X射线吸收精细结构研究铜上沉积的超薄镍膜的生长和形貌
机译:Heusler合金CO_2MNSI外延薄膜的电子和磁性特性面向X射线磁性圆形二色性研究的MgO屏障
机译:铁磁和反铁磁薄膜的X射线吸收光谱和显微镜研究,并用于交换各向异性。
机译:X射线衍射和吸收对Nd0.35Sr0.65MnO3 / SrTiO3外延膜中Mn离子轨道和磁结构的应变效应
机译:通过Mn L边x射线吸收比较GeMn薄膜的磁性