首页> 外文期刊>Applied Physicsletters >Anisotropic stress relief mechanism in epitaxial La_(0.67)Sr_(0.3)MnO_3 films
【24h】

Anisotropic stress relief mechanism in epitaxial La_(0.67)Sr_(0.3)MnO_3 films

机译:外延La_(0.67)Sr_(0.3)MnO_3薄膜的各向异性应力释放机理

获取原文
获取原文并翻译 | 示例
           

摘要

We report an anisotropic misfit stress relief mechanism in thin La_(0.67)Sr_(0.3)MnO_3 (LSMO) films coherently grown on NdGaO_3(110) substrates. These results are uniquely related to the orthorhombicity of the LSMO. The x-ray diffraction measurements and quantitative simulations demonstrate that biaxial mismatch stress is relieved differently along in-plane directions perpendicular to each other: in the [110] direction stress is accommodated by decrease of the y angle of the orthorhombic LSMO unit cell, while in the [001] direction stress is partially relieved by periodic lattice modulations.
机译:我们报告各向异性Las(0.67)Sr_(0.3)MnO_3(LSMO)薄膜在NdGaO_3(110)衬底上相干生长的各向异性失配应力消除机制。这些结果与LSMO的正交性有关。 X射线衍射测量和定量模拟表明,沿彼此垂直的面内方向,双轴不匹配应力的缓解方式有所不同:在[110]方向上,应力通过正交晶系LSMO晶胞的y角减小而得到缓解,而在[001]方向上的应力通过周期性的晶格调制而部分缓解。

著录项

  • 来源
    《Applied Physicsletters》 |2009年第15期|152508.1-152508.3|共3页
  • 作者单位

    Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA;

    MESA Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands;

    MESA Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands;

    MESA Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands;

    MESA Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands;

    MESA Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号