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Improved stability of a phase change memory device using Ge-doped SbTe at varying ambient temperature

机译:在不同的环境温度下使用掺Ge的SbTe改善相变存储器件的稳定性

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摘要

Ge-doped SbTe (Ge-ST) was compared with Ge_2Sb_2Te_5 (GST) for its potential use in the phase-change memory with improved stability at varying ambient temperature (T_A). Device characteristics such as RESET current, RESET resistance, and SET resistance of Ge-ST devices were found to vary significantly less with T_A than those of GST devices. From measured carrier density, mobility, and optical band gaps, these findings are interpreted to derive from a metallic nature of the crystalline Ge-ST in contrast with a semiconducting nature of the crystalline GST as well as a relatively weaker covalent bonding in amorphous Ge-ST.
机译:将Ge掺杂的SbTe(Ge-ST)与Ge_2Sb_2Te_5(GST)进行了比较,发现其在相变存储器中的潜在用途以及在变化的环境温度(T_A)下具有更高的稳定性。发现在使用T_A时,Ge-ST器件的器件特性(例如RESET电流,RESET电阻和SET电阻)与GST器件相比,变化很小。根据测得的载流子密度,迁移率和光学带隙,这些发现被解释为源自晶体Ge-ST的金属性质,与晶体GST的半导体性质以及非晶Ge-ST中相对较弱的共价键形成对比。 ST。

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  • 来源
    《Applied Physicsletters》 |2010年第13期|p.133510.1-133510.3|共3页
  • 作者单位

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Sungbuk-ku,Seoul 136-791, Republic of Korea Department of Material Science and Engineering, Korea Advanced Institute of Science and Technology,335 Gwahangno, Yuseong-gu, Daejeon 305-701, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Sungbuk-ku,Seoul 136-791, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Sungbuk-ku,Seoul 136-791, Republic of Korea Department of Material Science and Engineering, Seoul National University Gwanak-ro, Gwanak-gu,Seoul 151-742, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Sungbuk-ku,Seoul 136-791, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Sungbuk-ku,Seoul 136-791, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Sungbuk-ku,Seoul 136-791, Republic of Korea;

    Department of Material Science and Engineering, Korea Advanced Institute of Science and Technology,335 Gwahangno, Yuseong-gu, Daejeon 305-701, Republic of Korea;

    Electronic Materials Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Sungbuk-ku,Seoul 136-791, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:18:48

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