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Giant anisotropic magnetoresistance in insulating ultrathin (Ga,Mn)As

机译:绝缘超薄(Ga,Mn)As中的巨型各向异性磁阻

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摘要

Molecular-beam epitaxy grown, 5 nm thick annealed Ga_(0.95)Mn_(0.05)As films demonstrate transition from metallic to insulating state for sheet resistances near resistance quantum, which we connect with the two-dimensional hole localization. Below the metal-insulator transition we found the giant anisotropic magnetoresistance (GAMR) effect, which depends on the orientation of magnetization to crystallographic axes and demonstrates the twofold symmetry angular dependence. The GAMR manifests itself in positive magnetoresistance near 50% at T=1.7 K for H//[110] crystallographic direction in contrast to smaller negative magnetoresistance for H//[110] direction. We connect the GAMR with formation of high- and low-resistance states with different localization due to anisotropic spin-orbit interaction.
机译:分子束外延生长,退火厚度为5 nm的Ga_(0.95)Mn_(0.05)As薄膜显示了在电阻量子附近薄层电阻从金属态转变为绝缘态的过程,这与二维空穴定位有关。在金属-绝缘体过渡之下,我们发现了巨大的各向异性磁阻(GAMR)效应,该效应取决于磁化方向对结晶轴的方向,并表现出双重对称的角度依赖性。与H // [110]方向较小的负磁阻相反,GAMR在T = 1.7 K时在H // [110]结晶方向的正磁阻接近50%。由于各向异性的自旋轨道相互作用,我们将GAMR与具有不同局部性的高阻态和低阻态的形成联系起来。

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  • 来源
    《Applied Physicsletters》 |2010年第5期|052114.1-052114.3|共3页
  • 作者单位

    Institute of Experimental and Applied Physics, University of Regensburg, Universitaetstrasse 31,93040 Regensburg, Germany;

    South Dakota School of Mines and Technology, 501 East Saint Joseph Street, Rapid City,South Dakota 57701, USA;

    Institute of Experimental and Applied Physics, University of Regensburg, Universitaetstrasse 31,93040 Regensburg, Germany;

    MAX-Laboratory, Lund University, 22100 Lund, Sweden;

    Institute of Experimental and Applied Physics, University of Regensburg, Universitaetstrasse 31,93040 Regensburg, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:18:40

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