Enhanced radiation tolerance in nitride multilayered nanofilms with small period-thicknesses

摘要

This paper demonstrates a substantial enhancement in radiation tolerance for small period-thickness of CrN/AlTiN multilayered nanofilms. CrN/AlTiN multilayered nanofilms with period-thicknesses of 3, 5, 7, and 9nm were irradiated by 190 keV Ar~+ ions to fluences ranging from 1 to 5 × 10~(-16) ions/ cm~2. Nanofilm with 3 nm period-thickness begins to be amorphized under 5 × 10~(-16) ions/cm~2, while those with larger period-thicknesses are amorphized under 3 × 10~(-16) ions/cm~2. Our results show that multilayered ceramic nanofilms are potential radiation tolerant materials with good properties. The interfaces in the multilayered nanofilms act as good sinks to absorb the radiation-induced defects.