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Robust low resistivity p-type ZnO:Na films after ultraviolet illumination: The elimination of grain boundaries

机译:紫外线照射后坚固的低电阻率p型ZnO:Na膜:消除晶界

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摘要

We propose negatively charged oxygen species at grain boundaries may he detrimental to the p-type behavior. After ultraviolet illumination to release oxygen species, the p-type behavior of moderately Na-doped ZnO films is strengthened in the subsequent several minutes. A robust p-type film with a hole mobility of 7.9cm~2/Vs, a hole concentration of 2.1 × 10~(17)cm~(-3), and a film resistivity of 3.8 Ωcm has been reproducibly achieved. Transformation from n-type to p-type conduction is observed for the lightly Na-doped ZnO after ultraviolet illumination. We believe that single crystalline p-type ZnO films are indispensable for ZnO light-emitting diodes. American Institute of Physics.
机译:我们建议在晶界带负电荷的氧可能对p型行为有害。在紫外线照射下释放出氧之后,中等的Na掺杂ZnO薄膜的p型行为在随后的几分钟内得到增强。可再现地获得具有7.9cm〜2 / Vs的空穴迁移率,2.1×10〜(17)cm〜(-3)的空穴浓度和3.8Ωcm的膜电阻率的坚固的p型膜。紫外线照射后,轻掺杂Na的ZnO观察到从n型传导到p型传导。我们认为,单晶p型ZnO膜对于ZnO发光二极管是必不可少的。美国物理研究所。

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  • 来源
    《Applied Physics Letters》 |2012年第12期|p.122109.1-122109.4|共4页
  • 作者

    S. S. Lin;

  • 作者单位

    Department of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310027, China, State Key Laboratory of Modern Optical Instrumentation, Department of Optical Engineering, Zhejiang University, Hangzhou 310027, China, and State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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