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Exciton and carrier spin relaxations in InGaAs lattice-matched to off-cut Ge substrates

机译:InGaAs中的激子和载流子自旋弛豫与晶格切割的Ge衬底晶格匹配

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摘要

We have investigated the exciton and carrier spin relaxations in InGaAs lattice-matched to Ge substrates. Time-resolved spin-dependent pump and probe reflectance measurements revealed a spin relaxation behavior between 10 and 300 K. The presence of the carrier density dependence of spin relaxation time at 10-200 K implies that the Bir-Aronov-Pikus process is effective. At 250-300 K, the strong temperature and weak carrier density dependences of spin relaxation time show that the D'yakonov-Perel' process is dominant. The longest observed spin relaxation time of 2.6 ns at 77 K is explained by the decrease in the spatial overlap of electrons and holes.
机译:我们已经研究了与Ge衬底晶格匹配的InGaAs中的激子和载流子自旋弛豫。时间分辨的自旋依赖性泵浦和探针反射率测量显示自旋弛豫行为在10到300 K之间。自旋弛豫时间在10-200 K范围内的载流子密度依赖性表示存在Bir-Aronov-Pikus过程是有效的。在250-300 K时,自旋弛豫时间的强温度和弱载流子密度依赖性表明D'yakonov-Perel'过程占主导地位。在77 K下观察到的最长的自旋弛豫时间为2.6 ns,这是由于电子和空穴的空间重叠减少所致。

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  • 来源
    《Applied Physics Letters》 |2012年第25期|p.252414.1-252414.3|共3页
  • 作者单位

    Department of Applied Physics, Waseda University, Shinjuku, Tokyo 169-8555, Japan;

    Department of Applied Physics, Waseda University, Shinjuku, Tokyo 169-8555, Japan;

    Department of Applied Physics, Waseda University, Shinjuku, Tokyo 169-8555, Japan;

    Department of Applied Physics, Waseda University, Shinjuku, Tokyo 169-8555, Japan;

    Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Dushu Lake Higher Education Town, Ruoshui Road 398, Szhou Industrial Park, Suzhou, China;

    Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Dushu Lake Higher Education Town, Ruoshui Road 398, Szhou Industrial Park, Suzhou, China;

    Department of Applied Physics, Waseda University, Shinjuku, Tokyo 169-8555, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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