In_(0.53)Ga_(0.47)As metal-oxide-semiconductor field-effect transistors with self-aligned metal source/drain using Co-InGaAs alloys

摘要

We have demonstrated InGaAs metal-oxide-semiconductor field-effect transistors (MOSFETs) with self-aligned Co-lnGaAs source/drain (S/D). The fabricated MOSEFETs exhibited excellent transistor operation and an on/off ratio of 10~4 without any S/D ion implantation. It was found that the Co-lnGaAs alloys can be formed by direct reaction of Co and InGaAs during annealing at low temperature and that the unreacted Co is selectively etched from Co-InGaAs by an HC1 solution without significant etching of Co-lnGaAs. We also found that the Co-lnGaAs alloys have low sheet resistance of less than 50 Ω/square and relatively low Schottky barrier height of 0.12eV against electrons in InGaAs with high thermal stability.