机译:原子散射光谱法测定在ZnO上生长的半极性AlN的极性
Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan;
Department of Applied Chemistry, The University of Tokyo, Tokyo 113-8656, Japan Synchrotron Radiation Research Organization, The University of Tokyo, Tokyo 113-8656, Japan;
Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan;
Department of Applied Chemistry, The University of Tokyo, Tokyo 113-8656, Japan Synchrotron Radiation Research Organization, The University of Tokyo, Tokyo 113-8656, Japan;
CREST, Japan Science and Technology Agency (JST), Tokyo 102-0076, Japan Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan;
机译:原子散射光谱法测定在ZnO上生长的半极性AlN的极性
机译:同轴碰撞碰撞离子散射光谱法测定ZnO(0001)-Zn表面的晶格极性和表面弛豫
机译:使用原子平坦的ZnO衬底和室温外延缓冲层生长的半极性r平面GaN薄膜的光学性能的改进
机译:通过MBE生长的GaN / Aln / Si(111)中的ALN缓冲层厚度与GaN极性之间的相关性
机译:测量在硅上生长的原子上均匀银膜的电子结构使用角度分辨的光学激发光谱法
机译:ZnO上Ni接触的欧姆整流化及ZnO薄膜表面极性的可能确定
机译:同轴冲击碰撞离子散射光谱法测定C轴取向ZnO膜的表面极性