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Atomic scattering spectroscopy for determination of the polarity of semipolar AlN grown on ZnO

机译:原子散射光谱法测定在ZnO上生长的半极性AlN的极性

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摘要

Determination of the polarity of insulating semipolar AlN layers was achieved via atomic scattering spectroscopy. The back scattering of neutralized He atoms on AlN surfaces revealed the atomic alignment of the topmost layers of semipolar AlN and the ZnO substrate. Pole figures of the scattering intensity were used to readily determine the polarity of these wurtzite-type semipolar materials. In addition, we found that +R-plane AlN epitaxially grows on —R-plane ZnO, indicating that the polarity flips at the semipolar AlN/ZnO interface. This polarity nipping is possibly explained by the appearance of -c and m-faces on the —R ZnO surfaces, which was also revealed by atomic scattering spectroscopy.
机译:绝缘半极性AlN层的极性测定是通过原子散射光谱法完成的。在AlN表面上被中和的He原子的反向散射揭示了半极性AlN和ZnO衬底的最顶层的原子排列。散射强度的极图用于确定这些纤锌矿型半极性材料的极性。此外,我们发现+ R平面AlN在-R平面ZnO上外延生长,表明极性在半极性AlN / ZnO界面处翻转。这种极性夹挤可能是由-R ZnO表面上的-c和m面的出现所解释的,这也由原子散射光谱法揭示。

著录项

  • 来源
    《Applied Physics Letters》 |2013年第19期|192111.1-192111.3|共3页
  • 作者单位

    Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan;

    Department of Applied Chemistry, The University of Tokyo, Tokyo 113-8656, Japan Synchrotron Radiation Research Organization, The University of Tokyo, Tokyo 113-8656, Japan;

    Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan;

    Department of Applied Chemistry, The University of Tokyo, Tokyo 113-8656, Japan Synchrotron Radiation Research Organization, The University of Tokyo, Tokyo 113-8656, Japan;

    CREST, Japan Science and Technology Agency (JST), Tokyo 102-0076, Japan Institute of Industrial Science, The University of Tokyo, Tokyo 153-8505, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:16:42

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