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Depth-resolved cathodoluminescence spectroscopy of silicon supersaturated with sulfur

机译:硫超饱和硅的深度分辨阴极发光光谱

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摘要

We investigate the luminescence of Si supersaturated with S (Si:S) using depth-resolved cathodoluminescence spectroscopy and secondary ion mass spectroscopy as the S concentration is varied over 2 orders of magnitude (10~(18)-10~(20)cm~(-3)).In single-crystalline supersaturated Si:S, we identify strong luminescence from intra-gap states related to Si self-interstitials and a S-related luminescence at 0.85 eV, both of which show a strong dependence on S concentration in the supersaturated regime.Sufficiently high S concentrations in Si (>10~(20)cm~(-3)) result in complete luminescence quenching, which we propose is a consequence of the overlapping of the defect band and conduction band.
机译:我们使用深度解析阴极发光光谱法和二次离子质谱法研究了随着S浓度变化超过2个数量级(10〜(18)-10〜(20)cm〜)的S(Si:S)过饱和的Si的发光(-3))。在单晶过饱和Si:S中,我们从与Si自填隙相关的间隙内状态和与S相关的0.85 eV发光中识别出强发光,这两者都强烈依赖于S浓度Si中足够高的S浓度(> 10〜(20)cm〜(-3))会导致完全的发光猝灭,我们认为这是缺陷带和导带重叠的结果。

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  • 来源
    《Applied Physics Letters》 |2013年第3期|031909.1-031909.5|共5页
  • 作者单位

    IMEM-CNR Institute, viale Usberti 37/A, Parma, Italy,Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge,Massachusetts 02139, USA;

    Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge,Massachusetts 02139, USA;

    Harvard School of Engineering and Applied Sciences, Cambridge, Massachusetts 02138, USA;

    Harvard School of Engineering and Applied Sciences, Cambridge, Massachusetts 02138, USA;

    Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge,Massachusetts 02139, USA;

    IMEM-CNR Institute, viale Usberti 37/A, Parma, Italy;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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