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Trapped charge mapping in crystalline organic transistors by using scanning Kelvin probe force microscopy

机译:扫描开尔文探针力显微镜在晶体有机晶体管中的陷获电荷映射

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摘要

Trapped charge distributions at the interfaces between gate insulators and crystalline organic semiconductors in thin-film transistors are visualized by using a technique based on scanning Kelvin probe force microscopy (SKFM). For the charge density measurement, an ac voltage is applied to the gate electrode and its amplitude is adjusted so as to keep the electrostatic force constant between the SKFM tip and the semiconductor surface. The trapped charge density shows characteristic spatial distributions in the channel region, which varies by voltage stresses applied to the transistors. By comparing the charge distributions with the surface-potential profiles, trap mechanisms are discussed.
机译:通过使用基于扫描开尔文探针力显微镜(SKFM)的技术,可以观察薄膜晶体管中栅极绝缘体和晶体有机半导体之间的界面处的陷获电荷分布。为了进行电荷密度测量,将交流电压施加到栅电极,并调节其幅度,以使SKFM尖端和半导体表面之间的静电力保持恒定。捕获的电荷密度显示出沟道区域中的特征空间分布,该空间分布随施加到晶体管的电压应力而变化。通过将电荷分布与表面电势分布进行比较,讨论了陷阱机制。

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  • 来源
    《Applied Physics Letters》 |2014年第19期|193303.1-193303.4|共4页
  • 作者单位

    Central Research Laboratory, Hitachi, Ltd., 7-1-1 Omika, Hitachi, Ibaraki 312-1292, Japan;

    Central Research Laboratory, Hitachi, Ltd., 2520 Akanuma, Hatoyama, Saitama 350-0395, Japan;

    Hitachi Research Laboratory, Hitachi, Ltd., 7-1-1 Omika, Hitachi, Ibaraki 312-1292, Japan;

    Central Research Laboratory, Hitachi, Ltd., 2520 Akanuma, Hatoyama, Saitama 350-0395, Japan,Department of Physics, Tokyo Institute of Technology, 2-12-1 Oh-okayama, Meguro, Tokyo 152-8551, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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