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Au-gated SrTiO_3 field-effect transistors with large electron concentration and current modulation

机译:具有大电子浓度和电流调制的金门控SrTiO_3场效应晶体管

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摘要

We report the fabrication of low-leakage rectifying Pt and Au Schottky diodes and Au-gated metal-semiconductor field effect transistors (MESFETs) on n-type SrTiO_3 thin films grown by hybrid molecular beam epitaxy. In agreement with previous studies, we find that compared to Pt, Au provides a higher Schottky barrier height with SrTiO_3. As a result of the large dielectric constant of SrTiO_3 and the large Schottky barrier height of Au, the Au-gated MESFETs are able to modulate ~1.6 × 10~(14)cm~(-2) electron density, the highest modulation yet achieved using metal gates in any material system. These MESFETs modulate current densities up to ~68 mA/mm, ~20× times larger than the best demonstrated SrTiO_3 MESFETs. We also discuss the roles of the interfacial layer, and the field-dependent dielectric constant of SrTiO_3 in increasing the pinch off voltage of the MESFET.
机译:我们报道了在低分子整流外延生长的n型SrTiO_3薄膜上制造低泄漏整流Pt和Au肖特基二极管以及Au门控金属半导体场效应晶体管(MESFET)。与先前的研究一致,我们发现与Pt相比,Au在SrTiO_3的作用下具有更高的肖特基势垒高度。由于SrTiO_3的大介电常数和Au的肖特基势垒高度大,Au门控MESFET能够调制〜1.6×10〜(14)cm〜(-2)电子密度,这是迄今为止实现的最高调制在任何材料系统中使用金属门。这些MESFET的电流密度高达〜68 mA / mm,比最佳演示SrTiO_3 MESFET的约20倍大。我们还讨论了界面层的作用以及SrTiO_3的场相关介电常数在提高MESFET的夹断电压中的作用。

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  • 来源
    《Applied Physics Letters》 |2014年第11期|113512.1-113512.4|共4页
  • 作者单位

    Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Materials Department, University of California, Santa Barbara, California 93106, USA;

    Materials Department, University of California, Santa Barbara, California 93106, USA;

    Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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