机译:提升纳米尺寸InAs通道金属氧化物半导体异质结构的关态带隙极限
TSMC, Kapeldreef 75, 3001 Leuven, Belgium;
TSMC, Kapeldreef 75, 3001 Leuven, Belgium;
TSMC, Kapeldreef 75, 3001 Leuven, Belgium;
TSMC, Kapeldreef 75, 3001 Leuven, Belgium;
Ingram School of Engineering, Texas State University, San Marcos, Texas 78666, USA;
Ingram School of Engineering, Texas State University, San Marcos, Texas 78666, USA;
Ingram School of Engineering, Texas State University, San Marcos, Texas 78666, USA;
TSMC, 168 Park Ave. 2, Hsinchu Science Park, Hsinchu, 300 Taiwan, Republic of China;
Ingram School of Engineering, Texas State University, San Marcos, Texas 78666, USA;
TSMC, 168 Park Ave. 2, Hsinchu Science Park, Hsinchu, 300 Taiwan, Republic of China;
机译:提升纳米尺寸InAs通道金属氧化物半导体异质结构的关态带隙极限
机译:使用小带隙InAs沟道层的基于锑化物的耗尽型金属氧化物半导体场效应晶体管
机译:InAs,InSb和GaSb N沟道纳米线金属氧化物半导体场效应晶体管在弹道输运极限中的性能比较
机译:具有原子层沉积的Al_2O_3栅极介电层的InAs沟道金属氧化物半导体HEMT
机译:纳米N沟道和P沟道金属氧化物半导体场效应晶体管的超薄氧化物和氮化物/氧化物堆叠的栅极电介质研究
机译:基于极化诱导的二维空穴气的P沟道InGaN / GaN异质结构金属氧化物半导体场效应晶体管
机译:P沟道Ingan / GaN异质结构金属氧化物半导体场效应晶体管基于极化诱导的二维空气气体
机译:Inas / alsb中一维量子通道的表征。