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Magneto-transport and Kondo effect in cobalt doped Bi_2Se_3 topological insulators

机译:钴掺杂Bi_2Se_3拓扑绝缘子的磁输运和近藤效应

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摘要

Weak magnetic perturbation on the surface of topological insulators breaks the time reversal symmetry and opens the energy gap. We report the effect of cobalt doping in Bi_2Se_3 single crystals grown by the modified Bridgeman technique. The magnetic susceptibility of the cobalt doped Bi_2Se_3 changes from diamagnetic to paramagnetic at room temperature and then to ferromagnetic at 2K. The Kondo effect was observed in bulk crystals for Bi_(1.8)Co_(0.2)Se_3 (i.e., 10% Co doped in Bi_2Se_3), whereas the lower doping of cobalt results in a simple metallic behavior. In order to study the surface properties, the devices were fabricated on mechanically exfoliated thin (~70 nm) flakes of Bi_(1.8)Co_(0.2)Se_3 obtained from the bulk crystal. Semiconducting behavior can be clearly seen in Bi_(1.8)Co_(0.2)Se_3 devices at T>40K, and the Kondo effect was observed when the temperature was below 40 K. In the Bi_(1.8)Co_(0.2)Se_3 device, the weak antilocalization to weak localization transition observed in magnetoresistance behavior at T ~ 40 K indicates the band opening at the Dirac point.
机译:拓扑绝缘体表面的弱磁扰动会破坏时间反转对称性并打开能隙。我们报告了通过改良的布里奇曼技术生长的Bi_2Se_3单晶中钴掺杂的影响。钴掺杂的Bi_2Se_3的磁化率在室温下从反磁性变为顺磁性,然后在2K时变为铁磁性。对于块状Bi_(1.8)Co_(0.2)Se_3(即Bi_2Se_3中掺杂了10%Co),在块状晶体中观察到了近藤效应,而钴的较低掺杂导致了简单的金属行为。为了研究表面性能,在从大块晶体中获得的Bi_(1.8)Co_(0.2)Se_3机械剥落的薄片(〜70 nm)薄片上制造了器件。在T> 40K的Bi_(1.8)Co_(0.2)Se_3器件中可以清楚地看到半导体行为,并且当温度低于40 K时可以观察到近藤效应。在Bi_(1.8)Co_(0.2)Se_3器件中,在T〜40 K时,在磁阻行为中观察到了弱的抗局部化到弱局部化转变,这表明在狄拉克点处带打开。

著录项

  • 来源
    《Applied Physics Letters》 |2015年第17期|173108.1-173108.5|共5页
  • 作者单位

    Department of Physics, Indian Institute of Technology Delhi (IITD), New Delhi 110016, India;

    Department of Physics, Indian Institute of Technology Delhi (IITD), New Delhi 110016, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:23

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