首页> 外文期刊>Applied Physics Letters >Giant magnetoelectric coupling interaction in BaTiO_3/BiFeO_3/BaTiO_3 trilayer multiferroic heterostructures
【24h】

Giant magnetoelectric coupling interaction in BaTiO_3/BiFeO_3/BaTiO_3 trilayer multiferroic heterostructures

机译:BaTiO_3 / BiFeO_3 / BaTiO_3三层多铁性异质结构中的巨磁电耦合相互作用

获取原文
获取原文并翻译 | 示例
       

摘要

Multiferroic trilayer thin films of BaTiO_3/BiFeO_3/BaTiO_3 were prepared by RF-magnetron sputtering technique at different thicknesses of BiFeO_3 layer. A pure phase polycrystalline growth of thin films was confirmed from X-ray diffraction results. The film showed maximum remnant electric polarization (2P_r) of 13.5 μC/cm~2 and saturation magnetization (M_s) of 61 emu/cc at room temperature. Thermally activated charge transport dominated via oxygen vacancies as calculated by their activation energy, which was consistent with current-voltage characteristics. Magnetic field induced large change in resistance and capacitance of grain, and grain boundary was modeled by combined impedance and modulus spectroscopy in the presence of varied magnetic fields. Presence of large intrinsic magnetoelectric coupling was established by a maximum 20% increase in grain capacitance (C_g) with applied magnetic field (2kG) on trilayer having 20 run BiFeO_3 layer. Substantially higher magnetoelectric coupling in thinner films has been observed due to bonding between Fe and Ti atoms at interface via oxygen atoms. Room temperature magnetoelectric coupling was confirmed by dynamic magnetoelectric coupling, and maximum longitudinal magnetoelectric coupling of 515mV/cm-Oe was observed at 20 nm thickness of BiFeO_3. The observed magnetoelectric properties are potentially useful for novel room temperature magnetoelectric and spintronic device applications for obtaining higher voltage at lower applied magnetic field.
机译:采用射频磁控溅射技术在不同厚度的BiFeO_3层上制备了BaTiO_3 / BiFeO_3 / BaTiO_3的三铁多层薄膜。从X射线衍射结果证实了薄膜的纯相多晶生长。该膜在室温下的最大剩余极化强度(2P_r)为13.5μC/ cm〜2,饱和磁化强度(M_s)为61 emu / cc。由其激活能计算出的氧空位占主导地位的热激活电荷传输,这与电流-电压特性一致。磁场引起晶粒电阻和电容的大变化,并且在存在变化磁场的情况下,通过组合阻抗和模量光谱对晶粒边界进行建模。通过在具有20层BiFeO_3层的三层上施加磁场(2kG),最大增加20%的晶粒电容(C_g),可以建立大的固有磁电耦合。由于通过氧原子在界面处的Fe和Ti原子之间的键合,已观察到在较薄的膜中基本上较高的磁电耦合。通过动态磁电耦合确定了室温磁电耦合,并且在BiFeO_3的厚度为20 nm时观察到最大纵向磁电耦合为515mV / cm-Oe。所观察到的磁电性质可能对于新颖的室温磁电和自旋电子器件应用有用,以在较低的施加磁场下获得较高的电压。

著录项

  • 来源
    《Applied Physics Letters》 |2015年第8期|082908.1-082908.5|共5页
  • 作者单位

    CSIR-National Physical Laboratory, New Delhi 110012, India;

    CSIR-National Physical Laboratory, New Delhi 110012, India;

    Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:15:20

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号