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Donor-doping and reduced leakage current in Nb-doped Na_(0.5)Bi_(0.5)TiO_3

机译:Nb掺杂Na_(0.5)Bi_(0.5)TiO_3中的施主掺杂和降低的漏电流

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摘要

Low levels of so-called "donor-doping" in titanate-based perovskite oxides such as La for Ba, Sr, and Nb for Ti in (Ba, Sr)TiO_3 can significantly reduce the resistivity of these typical (d~0) dielectric materials and expand application areas to positive temperature coefficient resistors, thermoelec-trics, conductive wafers as thin film substrates, and solid oxide fuel cell anode materials. Here, we show low levels of Nb-doping (≤ 1 at. %) on the Ti-site in the well-known lead-free piezoelectric perovskite oxide Na_(0.5)Bi_(0.5)TiO_3 (NBT) produces completely different behaviours whereby much higher resistivity is obtained, therefore indicating a different donor-doping (substitution) mechanism. There is a switch in conduction mechanism from oxygen-ions in undoped NBT with an activation energy (E_a) of <0.9 eV to electronic (band gap) conduction in 0.5-1 at. % Nb-doped NBT with E_a~ 1.5-1.8 eV. This demonstrates the necessity of further systematic doping studies to elucidate the defect chemistry of NBT which is clearly different to that of (Ba,Sr)TiO_3. This defect chemistry needs to be understood if NBT-based materials are going to be manufactured on a large scale for commercial applications. This study also illustrates different donor-doping mechanisms to exist within the family of d~0 titanate-based perovskites.
机译:在钛酸盐基钙钛矿氧化物中少量存在所谓的“给体掺杂”,例如(Ba,Sr)TiO_3中的La表示La,Ba,Sr和Nb表示Ti,可显着降低这些典型(d〜0)电介质的电阻率材料,并将应用范围扩展到正温度系数电阻器,热电,作为薄膜基板的导电晶片以及固体氧化物燃料电池阳极材料。在这里,我们发现在众所周知的无铅压电钙钛矿氧化物Na_(0.5)Bi_(0.5)TiO_3(NBT)中,Ti部位的Nb掺杂水平低(≤1 at。%),从而产生完全不同的行为,从而获得了更高的电阻率,因此表明了不同的施主掺杂(替代)机理。传导机制从未掺杂NBT中的氧离子(活化能(E_a)<0.9 eV)切换为电子(带隙)传导(0.5-1 at)。 E_a〜1.5-1.8 eV的Nb掺杂NBT百分比。这表明进一步进行系统掺杂研究以阐明NBT的缺陷化学的必要性,该化学明显不同于(Ba,Sr)TiO_3。如果要大规模生产基于NBT的材料用于商业应用,则需要了解这种缺陷化学。这项研究还说明了基于d〜0钛酸酯的钙钛矿家族中存在着不同的供体掺杂机制。

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  • 来源
    《Applied Physics Letters》 |2015年第10期|102904.1-102904.5|共5页
  • 作者单位

    Department of Materials Science and Engineering, University of Sheffield, Sir Robert Hadfield Building, Mappin Street, Sheffield S1 3JD, United Kingdom;

    Department of Materials Science and Engineering, University of Sheffield, Sir Robert Hadfield Building, Mappin Street, Sheffield S1 3JD, United Kingdom;

    Institute of Materials Science, Technische Universitaet Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany;

    Department of Materials Science and Engineering, University of Sheffield, Sir Robert Hadfield Building, Mappin Street, Sheffield S1 3JD, United Kingdom;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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