Femtosecond laser ablation of polymethylmethacrylate via dual-color synthesized waveform

摘要

We have demonstrated the laser ablation of PMMA using dual-color waveform synthesis of the fundamental (ω) and its second-harmonic (2ω) of a femtosecond Ti:Sapphire laser. A modest and yet clear modulation (～22%) in ablated area versus relative phase between the 2ω and ω beams with a power-ratio of 15% (28/183 mW) is revealed. This is explained qualitatively by the dependence of ablation on multiphoton ionization of which the rate is related to the relative phase of the synthesized waveform. At higher peak power ratios, the modulation decreases rapidly, as the two-photon-ionization rate of the 2ω dominates over that of the three- to four- photon ionization of the ω beam. This technique demonstrates the feasibility of phase-controlled laser processing of materials.