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Epitaxial yttrium iron garnet film for fabrication of high frequency on-chip inductors

机译:外延钇铁石榴石薄膜,用于制造高频片上电感器

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摘要

The application of epitaxial yttrium iron garnet (YIG) thin film on high frequency on-chip spiral inductors is investigated. The YIG thin film with the thickness of 3.6 μm was grown on GGG(111) substrate using the liquid phase method, which exhibits relatively high saturation magnetization 4πM_s of 1615 Oe close to the bulk value of 1750 Oe and low initial coercivity H_c of 0.5 Oe that minimizes the hysteretic losses. Subsequently, the spiral inductors were directly fabricated on the YIG/GGG(111) substrate. The results show substantial improvement in the optimum operating frequency and self-resonance frequency of the on-chip spiral inductor with the YIG thin film with an increase of 50% up to ~7.5 GHz and 14.2 GHz, respectively, implying that on-chip spiral inductors with the YIG thin film can be applied to much higher frequency RF circuits.
机译:研究了外延钇铁石榴石(YIG)薄膜在高频片上螺旋电感器上的应用。使用液相法在GGG(111)衬底上生长了厚度为3.6μm的YIG薄膜,该薄膜表现出相对较高的饱和磁化强度4πM_s为1615 Oe,接近于1750 Oe的体积值,并且初始矫顽力H_c为0.5 Oe使磁滞损耗最小。随后,将螺旋电感器直接制造在YIG / GGG(111)基板上。结果表明,采用YIG薄膜的片上螺旋电感器的最佳工作频率和自谐振频率有了显着改善,在〜7.5 GHz和14.2 GHz时分别提高了50%,这表明片上螺旋带有YIG薄膜的电感器可以应用于更高频率的RF电路。

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  • 来源
    《Applied Physics Letters》 |2016年第16期|162405.1-162405.5|共5页
  • 作者单位

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China ,Tsinghua National Laboratory for Information Science and Technology, Tsinghua University, Beijing 100084, China;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China ,Tsinghua National Laboratory for Information Science and Technology, Tsinghua University, Beijing 100084, China;

    Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P. O. Box 603, Beijing 100190, China;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China ,Tsinghua National Laboratory for Information Science and Technology, Tsinghua University, Beijing 100084, China;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China ,Tsinghua National Laboratory for Information Science and Technology, Tsinghua University, Beijing 100084, China;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China ,Tsinghua National Laboratory for Information Science and Technology, Tsinghua University, Beijing 100084, China;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China ,Tsinghua National Laboratory for Information Science and Technology, Tsinghua University, Beijing 100084, China;

    Institute of Microelectronics, Tsinghua University, Beijing 100084, China ,Tsinghua National Laboratory for Information Science and Technology, Tsinghua University, Beijing 100084, China;

    Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P. O. Box 603, Beijing 100190, China;

    State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China;

    State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:50

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