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Optical sites in Eu- and Mg-codoped GaN grown by NH_3-source molecular beam epitaxy

机译:NH_3源分子束外延生长在Eu和Mg掺杂的GaN中的光学位点

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摘要

Mg codoping can improve the luminescence properties of Eu-doped GaN. However, the enhanced optical sites differ depending on the fabrication method. In this study, the optical sites in Eu- and Mg-codoped GaN [GaN:(Eu, Mg)] grown by NH_3-source molecular beam epitaxy (MBE) were evaluated. The optical properties of an Eu-Mg-related site grown by NH_3-MBE were highly stable against thermal annealing. Although the luminescence at sites A (622.3 and 633.8 nm) and B (621.9 and 622.8 nm) was dominant under indirect excitation of Eu ions through GaN, four different optical site groups in addition to sites A and B were observed under resonant excitation. These optical sites are inconsistent with the Eu-Mg-related sites reportedly observed in GaN:(Eu, Mg) fabricated by organometallic vapor phase epitaxy, indicating that the optical site constitution strongly depends on the growth method. Furthermore, site A, with a high cross section, contributed to as much as 22% of the total photoluminescence (PL) integrated intensity for GaN:(Eu, Mg) grown by NH_3-MBE, which resulted in a high PL intensity.
机译:Mg共掺杂可以改善Eu掺杂GaN的发光性能。然而,增强的光学位置根据制造方法而不同。在这项研究中,评估了由NH_3源分子束外延(MBE)生长的Eu和Mg掺杂的GaN [GaN:(Eu,Mg)]中的光学位点。 NH_3-MBE生长的Eu-Mg相关位点的光学性质对热退火具有高度稳定性。尽管在Eu离子通过GaN间接激发下,位点A(622.3和633.8 nm)和B(621.9和622.8 nm)处的发光占主导地位,但在共振激发下除位点A和B之外还观察到四个不同的光学位点组。这些光学位点与据报道在通过有机金属气相外延制造的GaN:(Eu,Mg)中观察到的Eu-Mg相关位点不一致,这表明光学位点的构成很大程度上取决于生长方法。此外,具有高横截面的位点A占NH_3-MBE所生长的GaN:(Eu,Mg)的总光致发光(PL)集成强度的22%,这导致了高PL强度。

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  • 来源
    《Applied Physics Letters》 |2016年第15期|151106.1-151106.4|共4页
  • 作者单位

    Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8580, Japan;

    Department of Research, Interdisciplinary Graduate School of Medicine and Engineering, Division of Engineering, Electromechanical and Information System Engineering, University of Yamanashi, Kofu, Yamanashi 400-8510, Japan;

    Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8580, Japan;

    Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8580, Japan;

    Department of Research, Interdisciplinary Graduate School of Medicine and Engineering, Division of Engineering, Electromechanical and Information System Engineering, University of Yamanashi, Kofu, Yamanashi 400-8510, Japan;

    Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, Toyohashi, Aichi 441-8580, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:48

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