机译:n型SiGe薄膜中纳米增强的面内热电品质因数
Department of Mechanical and Aerospace Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong;
Department of Mechanical and Aerospace Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong;
Department of Mechanical and Aerospace Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong,The Hong Kong University of Science and Technology Shenzhen Research Institute, Shenzhen, China;
机译:P型BI0.5SB1.5TE3薄膜的平面内热电系数,具有温度依赖的薄膜,接近450 k
机译:火花等离子烧结纳米结构n型SiGe合金的增强热电品质因数
机译:火花等离子烧结纳米结构n型SiGe合金的增强热电品质因数
机译:紧凑的多功能测试结构,可测量薄膜的面内热电品质因数ZT
机译:各向异性半导体薄膜:合成,面内和面内表征以及热电应用。
机译:n型二硫化钼(MoS2)薄膜的热电性质的简单测量方法
机译:增强硼掺杂siGe薄膜的热电品质因数 通过纳米粒子边界