机译:在4H-SiC(0001)衬底上的准自支撑双层外延石墨烯场效应晶体管
National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;
National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China,School of Electronic and Information Engineering, Hebei University of Technology, Tianjin 300130, China;
National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;
National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;
National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;
National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;
National Key Laboratory of ASIC, Hebei Semiconductor Research Institute, Shijiazhuang 050051, China;
机译:电子束辐照在4H-SiC(0001)衬底上Bernal双层外延石墨烯的选择性区域生长
机译:电子束辐照在4H-SiC(0001)衬底上Bernal双层外延石墨烯的选择性区域生长
机译:衬底台阶和单层-双层结对4H-SiC上外延石墨烯中电子传输的影响(0001)
机译:衬底步骤和单层双层结的影响在4H-SiC(0001)上的外延石墨烯中的电子输送
机译:2-D电子材料:6h-碳化硅上石墨烯的外延生长(0001)
机译:在离轴4H-SiC上生长的外延石墨烯的纳米级结构表征(0001)
机译:准自立单轴和双层石墨烯在同质外轴4H-SiC(0001)层上的生长