机译:在塑料基板上印刷有In_(0.2)Ga_(0.8)As / GaAs / In_(0.2)Ga_(0.8)As三层纳米膜的可弯曲MOS电容器
School of Microelectronics and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, 3445 Engineering Hall, Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, 3445 Engineering Hall, Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, 3445 Engineering Hall, Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, 3445 Engineering Hall, Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, 3445 Engineering Hall, Madison, Wisconsin 53706, USA;
School of Microelectronics and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China;
School of Microelectronics and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China;
School of Microelectronics and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China;
School of Physics and Optoelectronic Engineering, Xidian University, Xi'an 710071, China;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, 3445 Engineering Hall, Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, 3445 Engineering Hall, Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, 1415 Engineering Drive, 3445 Engineering Hall, Madison, Wisconsin 53706, USA;
机译:T-Gate结构不同的Al_(0.2)Ga_(0.8)As / In_(0.2)Ga_(0.8)As MOS-pHEMT的研究
机译:具有GaAs / AlGaAs超晶格缓冲层的Al_(0.2)Ga_(0.8)As / In_(0.22)Ga_(0.78)As伪非晶双异质结调制掺杂场效应晶体管的温度相关特性
机译:在SiO_2图案邻域(001)GaAs衬底上形成GaAs线结构和位置控制的In_(0.8)Ga_(0.2)As量子点
机译:具有复合IN_(0.8)GA_(0.2)的变形HFET,如GaAs衬底上的通道/ INA / IN_(0.8)GA_(0.2)
机译:La0.8Sr0.2MnO 3±δ阴极的热力学研究,包括缺陷化学,电导率和热机械性能的预测
机译:用SM0.2CE0.8O1.9电解液对称细胞中Ba0.5Sr0.5Co0.8FCO0.8FE0.2O3-δ的电化学性能。一氧化氮还原反应
机译:两种声子模三元合金中的电子 - 声子耦合 $ al_ {0.25} In_ {0.75} as / Ga_ {0.25} In_ {0.75} as量子井
机译:具有/不具有al(0.2)Ga(0.8)阻挡层的高性能Inas / Gaas量子点红外光电探测器。