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Distinct light emission from two-dimensional electron gas at a lattice-matched InAIN/AIGaN heterointerface

机译:来自晶格匹配的InAIN / AIGaN异质界面的二维电子气的不同发光

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摘要

We report on distinct light emission from two-dimensional electron gas (2DEG) at a lattice-matched (LM) In0.12Al0.88N/Al0.21Ga0.79N heterointerface. The recombination between the electrons in the 2DEG in the ground state E-1 and photoexcited holes in the Al0.21Ga0.79N layer was identified. In contrast to GaN channel-based heterostructures (HSs), larger activation energy of the 2DEG-related emission from LM In0.12Al0.88N/Al0.21Ga0.79N HS was obtained to be approximately 17 meV, which enables the distinguished 2DEG photoluminescence (PL) peak to be more thermally stable. Moreover, the existence of the 2DEG accelerates the reduction of the PL lifetime of the emission from Al0.21Ga0.79N. Compared to the general 2DEG PL feature with a broad recombination band in GaN channel-based HSs, the improved emission characteristics of the 2DEG in the In0.12Al0.88N/Al0.21Ga0.79N HS were attributed to electron localization in a deep triangular potential well, large 2DEG density induced by the In0.12Al0.88N layer, and the improvement of the interfacial crystal quality due to the lattice match between In0.12Al0.88N and Al0.21Ga0.79N layers. These findings provide important insight into understanding the InAlN-based HSs and will be potentially useful to advance the electronic and photonic applications for group-III nitrides. Published by AIP Publishing.
机译:我们报告从晶格匹配(LM)In0.12Al0.88N / Al0.21Ga0.79N异质界面的二维电子气(2DEG)发出不同的光。确定了基态为E-1的2DEG中的电子与Al0.21Ga0.79N层中的光激发空穴之间的复合。与基于GaN沟道的异质结构(HSs)相比,从LM In0.12Al0.88N / Al0.21Ga0.79N HS获得的2DEG相关发射的较大活化能约为17 meV,这使得杰出的2DEG光致发光( PL)峰值以使其更热稳定。此外,2DEG的存在加速了Al0.21Ga0.79N发射的PL寿命的缩短。与基于GaN通道的HS中具有较宽重组带的常规2DEG PL特征相比,In0.12Al0.88N / Al0.21Ga0.79N HS中2DEG的改善的发射特性归因于深三角形电势中的电子定位很好,In0.12Al0.88N层引起的2DEG密度大,并且由于In0.12Al0.88N和Al0.21Ga0.79N层之间的晶格匹配而改善了界面晶体的质量。这些发现为理解基于InAlNN的HS提供了重要的见识,并且对于推进III族氮化物的电子和光子应用将具有潜在的帮助。由AIP Publishing发布。

著录项

  • 来源
    《Applied Physics Letters》 |2018年第10期|102102.1-102102.4|共4页
  • 作者单位

    Nagoya Inst Technol, Res Ctr Nano Devices & Adv Mat, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Res Ctr Nano Devices & Adv Mat, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Res Ctr Nano Devices & Adv Mat, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Res Ctr Nano Devices & Adv Mat, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

    Nagoya Inst Technol, Res Ctr Nano Devices & Adv Mat, Showa Ku, Gokiso Cho, Nagoya, Aichi 4668555, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:13:52

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