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首页> 外文期刊>Annales de l'I.H.P >Influence of substrate misorientation on carbon impurity incorporation and electrical properties of p-GaN grown by metalorganic chemical vapor deposition
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Influence of substrate misorientation on carbon impurity incorporation and electrical properties of p-GaN grown by metalorganic chemical vapor deposition

机译:金属化学气相沉积基质杂散对碳杂质掺入与电学性质的影响

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摘要

The influence of substrate misorientation angle on carbon impurity incorporation and electrical properties of p-GaN grown at a low temperature of 900 degrees C has been explored. Secondary ion mass spectrometry results reveal that the concentration of unintentionally incorporated carbon impurity decreases remarkably (from 2 x 10(17) cm(-3) to 7 x 10(16) cm(-3)) with the increasing misorientation angle. The step motion model is introduced to explain the reason for decreasing carbon concentration with increasing misorientation angle. It has also been found the hole concentration of p-GaN increases and the resistivity of p-GaN decreases with the increasing misorientation angle since carbon acts as compensating donor in p-GaN. (C) 2019 The Japan Society of Applied Physics
机译:已经探讨了底物错误角度对900℃的低温生长的P-GaN的碳杂质掺入和电学性能的影响。二次离子质谱结果表明,无意中掺入的碳杂质的浓度显着降低(从2×10(17 )cm(-3)至7×10( - 3)),随着不论者的不论者的升级角度。介绍步进运动模型以解释随着误测角度降低碳浓度的原因。还发现,P-GaN的空穴浓度增加,并且P-GaN的电阻率随着碳作为补偿供体在P-GaN中的补偿时间而降低。 (c)2019年日本应用物理学会

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  • 来源
    《Annales de l'I.H.P 》 |2019年第5期| 055503.1-055503.4| 共4页
  • 作者单位

    Univ Sci & Technol China Sch Nano Technol & Nano Bion Hefei 230026 Peoples R China|Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Univ Sci & Technol China Sch Nano Technol & Nano Bion Hefei 230026 Peoples R China|Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

    Univ Sci & Technol China Sch Nano Technol & Nano Bion Hefei 230026 Peoples R China|Chinese Acad Sci Suzhou Inst Nanotech & Nanobion Suzhou 215123 Peoples R China|Chinese Acad Sci Key Lab Nanodevices & Applicat Suzhou 215123 Peoples R China;

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