Antireflection Polymer Hole Array Structures By Imprinting Using Metal Molds From Anodic Porous Alumina

摘要

Antireflection (AR) structures of polymer composed of an ordered array of holes with a tapered shape were formed by imprinting using a metal mold prepared from an anodic porous alumina. The metal molds (Ni) were prepared using an anodic porous alumina as a template and were used for the photoimprinting of polymers. The obtained AR structure exhibited a low reflectance of less than 1% for a single surface.