首页> 外文期刊> >Short-Pulse Operation of a High-Power-Density Proton-Implanted Vertical-Cavity Surface-Emitting Laser Array
【24h】

Short-Pulse Operation of a High-Power-Density Proton-Implanted Vertical-Cavity Surface-Emitting Laser Array

机译:高功率密度质子注入垂直腔表面发射激光器阵列的短脉冲操作。

获取原文
获取原文并翻译 | 示例
           

摘要

We report on a GaAs-based high-power-density vertical-cavity surface-emitting laser diode (VCSEL) array with ion-implanted isolated current apertures. A peak output power of 40.6 W has been achieved from the VCSEL array with seven emitters under 100-ns-pulse operation. This is the first demonstration of a ten-watt-class output power for a VCSEL array with ion-implanted isolated current aperture configuration. The corresponding power-density is estimated to be 73.8kW/cm~2, which is three times greater than the record power-density of the short-pulse-operated oxide-confined VCSEL.
机译:我们报告了基于GaAs的高功率密度垂直腔面发射激光二极管(VCSEL)阵列,该阵列具有离子注入隔离式电流孔径。 VCSEL阵列在100 ns脉冲操作下具有七个发射极,已实现40.6 W的峰值输出功率。这是具有离子注入隔离式电流孔径配置的VCSEL阵列的十瓦级输出功率的首次演示。相应的功率密度估计为73.8kW / cm〜2,这是短脉冲操作氧化物限制的VCSEL的记录功率密度的三倍。

著录项

  • 来源
    《》 |2012年第8期|p.082104.1-082104.3|共3页
  • 作者单位

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

    Hamamatsu Photonics K.K., Hamamatsu 434-8602, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号