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A differential pulse polarographic method for the determination of trace amounts of osmium (VIII) using a polarographic maximum wave

机译:使用极谱最大波测定微分脉冲极谱法测定痕量of(VIII)

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摘要

A differential pulse polarographic method for the determination of trace osmium (VIII) is described. In the presence of about 2000-times Cys, osmium (VIII) in a 1.0mol/dm~3 hydrochloric acid solution exhibits a well-defined maximum wave, or peak at -0.85V νs. SCE. The peak height in the presence of Cys was amplified about 1600-times. The Peak height depends on the concentration of hydrochloric acid, and reaches its maximum In a concentration range of 0.75 to 1.25mol/dm~3.
机译:描述了一种用于测定痕量(VIII)的差分脉冲极谱法。在约2000倍Cys的存在下,在1.0mol / dm〜3盐酸溶液中的solution(VIII)表现出明确的最大波动,或在-0.85Vνs处出现峰值。 SCE。在Cys存在下的峰高被放大了约1600倍。峰高取决于盐酸的浓度,在0.75至1.25mol / dm〜3的浓度范围内达到最大值。

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