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首页> 外文期刊>IEEE Transactions on Advanced Packaging >The effect of solder bump pitch on the underfill flow
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The effect of solder bump pitch on the underfill flow

机译:焊锡凸点间距对底部填充流量的影响

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An underfill encapsulant was used to fill the gap between the chip and substrate around solder joints to improve the long-term reliability of flip chip interconnect systems. The underfill encapsulant was filled by the capillary effect. In this study, the filling time and pattern of the underfill flow in the process with different bumping pitch, bump diameter, and gap size were investigated. A modified Hele-Shaw flow model, that considered the flow resistance in both the thickness direction and the restrictions between solder bumps, was used. This model estimated the flow resistance induced by the chip and substrate as well as the solder bumps, and provided a reasonable flow front prediction. A modified model that considered the effect of fine pitch solder bumps was also proposed to estimate the capillary force in fine pitch arrangements. It was found that, on a full array solder bump pattern, the filling flow was actually faster for fine pitch bumps in some arrangements. The filling time of the underfill process depends on the parameters of bumping pitch, bump diameter, and gap size. A proposed capillary force parameter can provide information on bump pattern design for facilitating the underfilling process.
机译:底部填充密封剂用于填充芯片和衬底之间焊点周围的间隙,以提高倒装芯片互连系统的长期可靠性。底部填充密封剂通过毛细作用填充。在这项研究中,研究了不同凸点间距,凸点直径和间隙尺寸的过程中底部填充流的填充时间和模式。使用修改后的Hele-Shaw流动模型,该模型同时考虑了厚度方向的流动阻力和焊料凸块之间的限制。该模型估计了由芯片和基板以及焊料凸点引起的流动阻力,并提供了合理的流动前沿预测。还提出了一种考虑细间距焊锡凸块影响的改进模型,以估算细间距布置中的毛细作用力。已经发现,在全阵列焊料凸块图案上,对于某些布置中的细间距凸块而言,填充流动实际上更快。底部填充工艺的填充时间取决于凸块间距,凸块直径和间隙尺寸的参数。提出的毛细作用力参数可以提供有关凸块图案设计的信息,以促进底部填充过程。

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