...
首页> 外文期刊>Advanced Materials >Recent Progress on Perovskite Surfaces and Interfaces in Optoelectronic Devices
【24h】

Recent Progress on Perovskite Surfaces and Interfaces in Optoelectronic Devices

机译:光电器件临床曲面和界面的最新进展

获取原文
获取原文并翻译 | 示例
           

摘要

Surfaces and heterojunction interfaces, where defects and energy levels dictate charge-carrier dynamics in optoelectronic devices, are critical for unlocking the full potential of perovskite semiconductors. In this progress report, chemical structures of perovskite surfaces are discussed and basic physical rules for the band alignment are summarized at various perovskite interfaces. Common perovskite surfaces are typically decorated by various compositional and structural defects such as residual surface reactants, discrete nanoclusters, reactions by products, vacancies, interstitials, antisites, etc. Some of these surface species induce deep-level defect states in the forbidden band forming very harmful charge-carrier traps and affect negatively the interface band alignments for achieving optimal device performance. Herein, an overview of research progresses on surface and interface engineering is provided to minimize deep-level defect states. The reviewed subjects include selection of interface and substrate buffer layers for growing better crystals, materials and processing methods for surface passivation, the surface catalyst for microstructure transformations, organic semiconductors for charge extraction or injection, heterojunctions with wide bandgap perovskites or nanocrystals for mitigating defects, and electrode interlayer for preventing interdiffusion and reactions. These surface and interface engineering strategies are shown to be critical in boosting device performance for both solar cells and light-emitting diodes.
机译:表面和异质结界面,其中缺陷和能量水平决定光电器件中的电荷 - 载波动态,对于解锁佩洛夫斯半导体的全部电位是至关重要的。在此进度报告中,讨论了钙钛矿表面的化学结构,并且在各种Perovskite接口中总结了频带对准的基本物理规则。普通的钙钛矿表面通常是由各种组成和结构缺陷的诸如残留的表面反应物,离散纳米能器,由产品的反应,空位,间质,反腐蚀等各种组成缺陷而装饰。这些表面物种中的一些诱导禁带中的深层缺陷状态诱导成型有害电荷 - 载波陷阱并对界面带对准产生负面影响,以实现最佳设备性能。这里,提供了研究表面和接口工程上的研究概述,以最大限度地减少深度缺陷状态。审查的受试者包括选择界面和基底缓冲层,用于生长更好的晶体,材料和用于表面钝化的处理方法,用于微观结构变换的表面催化剂,用于电荷提取或注射的有机半导体,具有宽带凝血液或纳米晶体的杂交功能,用于缓解缺陷,和用于防止相互积分和反应的电极夹层。这些表面和界面工程策略被认为对促进太阳能电池和发光二极管的装置性能至关重要。

著录项

  • 来源
    《Advanced Materials》 |2021年第30期|2006004.1-2006004.24|共24页
  • 作者单位

    Southern Univ Sci & Technol Sch Microelect Shenzhen 518055 Guangdong Peoples R China|Univ Toronto Dept Mat Sci & Engn Toronto ON M5G 3E4 Canada;

    Univ Toronto Dept Mat Sci & Engn Toronto ON M5G 3E4 Canada|Yunnan Univ Ctr Optoelect Engn Res Dept Phys Kunming 650091 Yunnan Peoples R China;

    Univ Toronto Dept Mat Sci & Engn Toronto ON M5G 3E4 Canada;

    Southern Univ Sci & Technol Sch Microelect Shenzhen 518055 Guangdong Peoples R China;

    Southern Univ Sci & Technol Sch Microelect Shenzhen 518055 Guangdong Peoples R China|Univ Toronto Dept Mat Sci & Engn Toronto ON M5G 3E4 Canada|Yunnan Univ Ctr Optoelect Engn Res Dept Phys Kunming 650091 Yunnan Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    band alignment; gap states; interfaces; perovskites; surfaces;

    机译:频段对齐;差距;界面;佩洛夫斯库特;表面;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号