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首页> 外文期刊>Advanced Functional Materials >Effects of Defects on the Temperature-Dependent Thermal Conductivity of Suspended Monolayer Molybdenum Disulfide Grown by Chemical Vapor Deposition
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Effects of Defects on the Temperature-Dependent Thermal Conductivity of Suspended Monolayer Molybdenum Disulfide Grown by Chemical Vapor Deposition

机译:缺陷对化学气相沉积法制得的悬浮单层二硫化钼随温度变化的导热系数的影响

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摘要

It is understood that defects of the atomic arrangement of the lattice in 2D molybdenum disulfide (MoS2) grown by chemical vapor deposition (CVD) can have a profound effect on the electronic and optical properties. Beyond these it is a major prerequisite to also understand the fundamental effect of such defects on phonon transport, to guarantee the successful integration of MoS2 into the solid-state devices. A comprehensive joint experiment-theory investigation to explore the effect of lattice defects on the thermal transport of the suspended MoS2 monolayer grown by CVD is presented. The measured room temperature thermal conductivity values are 30 +/- 3.3 and 35.5 +/- 3 W m(-1) K-1 for two samples, which are more than two times smaller than that of their exfoliated counterpart. High-resolution transmission electron microscopy shows that these CVD-grown samples are polycrystalline in nature with low angle grain boundaries, which is primarily responsible for their reduced thermal conductivity. Higher degree of polycrystallinity and aging effects also result in smoother temperature dependency of thermal conductivity () at temperatures below 100 K. First-principles lattice dynamics simulations are carried out to understand the role of defects such as isotopes, vacancies, and grain boundaries on the phonon scattering rates of our CVD-grown samples.
机译:可以理解,通过化学气相沉积(CVD)生长的二维二硫化钼(MoS2)中晶格的原子排列缺陷可能会对电子和光学性能产生深远影响。除此之外,还必须了解此类缺陷对声子传输的基本影响,以确保将MoS2成功集成到固态设备中,这是一个主要前提。进行了全面的联合实验理论研究,以探索晶格缺陷对通过CVD生长的悬浮MoS2单层的热输运的影响。对于两个样品,测得的室温热导率值分别为30 +/- 3.3和35.5 +/- 3 W m(-1)K-1,比其剥离的样品小两倍。高分辨率透射电子显微镜显示,这些CVD生长的样品本质上是多晶的,具有低角度晶界,这主要是由于它们降低了热导率。较高程度的多晶性和时效效应还导致在低于100 K的温度下热导率()的温度依赖性更加平稳。进行了第一性原理晶格动力学模拟,以了解诸如同位素,空位和晶界等缺陷在合金表面的作用。 CVD生长样品的声子散射率。

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