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Ferroelectric and Magnetic Properties in Room-Temperature Multiferroic GaxFe2-xO3 Epitaxial Thin Films

机译:室温多铁性GaxFe2-xO3外延薄膜中的铁电和磁性

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摘要

GaFeO3-type iron oxide is a promising room-temperature multiferroic material due to its large magnetization. To expand its usability, controlling the ferroelectric and magnetic properties is crucial. In this study, high-quality GaxFe2-xO3 (x = 0-1) epitaxial films are fabricated and their properties are systematically investigated. All films exhibit room-temperature out-of-plane ferroelectricity, showing that the coercive electric field (E-c) decreases monotonically with x. Additionally, the films show in-plane ferrimagnetism with a Curie temperature (TC) > 350 K at x = 0-0.6. The coercive magnetic field (H-c) decreases with x at x <= 0.6, but shows a constant value at x > 0.6, whereas the saturated magnetization (M-s) increases with x at x = 0.6, but decreases with x at x > 0.6. X-ray magnetic circular dichroism reveals that the large magnetization at x <= 0.6 is derived from Fe3+ (3d5) at octahedral sites. The controllable range of the E-c, H-c, and M-s values at room temperature (400-800 kV cm(-1), 1-8 kOe, and 0.2-0.6 mu(B)/f.u.) is very wide and differs from those of well-known multiferroic BiFeO3. Furthermore, the GaxFe2-xO3 films exhibit room-temperature magnetocapacitance effects, indicating that adjusting TC near room temperature is useful to achieve large room-temperature magnetocapacitance behavior.
机译:GaFeO3型氧化铁由于其较大的磁化强度而成为很有希望的室温多铁材料。为了扩大其可用性,控制铁电和磁性能至关重要。在这项研究中,制造高质量的GaxFe2-xO3(x = 0-1)外延膜,并对其性能进行系统地研究。所有薄膜均具有室温平面外铁电性,表明矫顽电场(E-c)随x单调降低。此外,薄膜在x = 0-0.6时具有居里温度(TC)> 350 K的面内亚铁磁性。矫顽磁场(H-c)在x <= 0.6处随x减小,但在x> 0.6处显示恒定值,而饱和磁化强度(M-s)在x = 0.6时随x增大,而在x> 0.6时随x减小。 X射线磁性圆二色性表明,x <= 0.6时的大磁化强度来自八面体位置的Fe3 +(3d5)。室温(400-800 kV cm(-1),1-8 kOe和0.2-0.6 mu(B)/ fu)的Ec,Hc和Ms值的可控制范围非常宽,并且与众所周知的多铁性BiFeO3。此外,GaxFe2-xO3薄膜具有室温磁电容效应,表明在室温附近调节TC对实现大的室温磁电容性能很有用。

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  • 来源
    《Advanced Functional Materials》 |2018年第2期|1704789.1-1704789.8|共8页
  • 作者单位

    Tokyo Inst Technol, Lab Mat & Struct, Midori Ku, 4259-J2-19 Nagatsuta Cho, Yokohama, Kanagawa 2268503, Japan;

    Tokyo Inst Technol, Lab Mat & Struct, Midori Ku, 4259-J2-19 Nagatsuta Cho, Yokohama, Kanagawa 2268503, Japan;

    Tokyo Inst Technol, Lab Mat & Struct, Midori Ku, 4259-J2-19 Nagatsuta Cho, Yokohama, Kanagawa 2268503, Japan;

    Tohoku Univ, Inst Mat Res, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan;

    Tohoku Univ, Inst Mat Res, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan;

    Tohoku Univ, Inst Mat Res, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan;

    Tokyo Inst Technol, Lab Mat & Struct, Midori Ku, 4259-J2-19 Nagatsuta Cho, Yokohama, Kanagawa 2268503, Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ferroelectricity; iron oxide; magnetism; multiferroics; thin films;

    机译:铁电;氧化铁;磁性;多铁性;薄膜;
  • 入库时间 2022-08-18 01:10:08

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