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首页> 外文期刊>Advanced energy materials >Grain Boundary Scattering of Charge Transport in n-Type (Hf,Zr)CoSb Half-Heusler Thermoelectric Materials
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Grain Boundary Scattering of Charge Transport in n-Type (Hf,Zr)CoSb Half-Heusler Thermoelectric Materials

机译:n型(Hf,Zr)CoSb半霍斯勒热电材料中电荷输运的晶界散射

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摘要

High thermoelectric figure of merit zT of approximate to 1.0 has been reported in both n- and p-type (Hf,Zr)CoSb-based half-Heusler compounds, and further improvement of thermoelectric performance relies on the insightful understanding of electron and phonon transport mechanisms. In this work, the thermoelectric transport features are analyzed for (Hf0.3Zr0.7)(1-x)NbxCoSb (x = 0.02-0.3) with a wide range of carrier concentration. It is found that, although both temperature and energy dependencies of charge transport resemble ionized impurity scattering, the grain boundary scattering is the dominant scattering mechanism near room temperature. With increasing carrier concentration and grain size, the influence of the grain boundary scattering on electron transport weakens. The dominant scattering mechanism changes from grain boundary scattering to acoustic phonon scattering as temperature rises. The lattice thermal conductivity decreases with increasing Nb doping content due to the increased strain field fluctuations. These results provide an in-depth understanding of the transport mechanisms and guidance for further optimizing thermoelectric properties of half-Heusler alloys and other thermoelectric systems.
机译:在基于n型和p型(Hf,Zr)CoSb的半霍斯勒化合物中均已报道了约1.0的高热电品质因数zT,热电性能的进一步提高依赖于对电子和声子传输的深刻理解机制。在这项工作中,分析了具有宽载流子浓度的(Hf0.3Zr0.7)(1-x)NbxCoSb(x = 0.02-0.3)的热电输运特征。发现,尽管电荷传输的温度和能量依赖性都类似于离子化的杂质散射,但晶界散射是室温附近的主要散射机制。随着载流子浓度和晶粒尺寸的增加,晶界散射对电子传输的影响减弱。随着温度升高,主要的散射机制从晶界散射变为声子声子散射。由于应变场波动的增加,晶格热导率随着Nb掺杂含量的增加而降低。这些结果为进一步优化半霍斯勒合金和其他热电系统的热电性能提供了深入的运输机理和指导。

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  • 来源
    《Advanced energy materials 》 |2019年第11期| 1803447.1-1803447.7| 共7页
  • 作者单位

    Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China|Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China;

    Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China|Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China;

    Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China|Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China;

    Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China|Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China;

    Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China|Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China;

    Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China|Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China;

    Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Zhejiang, Peoples R China|Zhejiang Univ, Sch Mat Sci & Engn, Hangzhou 310027, Zhejiang, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    charge transport; grain boundary scattering; half-Heusler; thermoelectric materials; ZrCoSb;

    机译:电荷传输;晶界散射;半霍斯勒;热电材料;ZrCoSb;

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