...
首页> 外文期刊>Advanced energy materials >Grain Boundary Scattering of Charge Transport in n-Type (Hf,Zr)CoSb Half-Heusler Thermoelectric Materials
【24h】

Grain Boundary Scattering of Charge Transport in n-Type (Hf,Zr)CoSb Half-Heusler Thermoelectric Materials

机译:n型(HF,Zr)中的电荷输送晶界散射胶束半风混合物热电材料

获取原文
获取原文并翻译 | 示例

摘要

High thermoelectric figure of merit zT of approximate to 1.0 has been reported in both n- and p-type (Hf,Zr)CoSb-based half-Heusler compounds, and further improvement of thermoelectric performance relies on the insightful understanding of electron and phonon transport mechanisms. In this work, the thermoelectric transport features are analyzed for (Hf0.3Zr0.7)(1-x)NbxCoSb (x = 0.02-0.3) with a wide range of carrier concentration. It is found that, although both temperature and energy dependencies of charge transport resemble ionized impurity scattering, the grain boundary scattering is the dominant scattering mechanism near room temperature. With increasing carrier concentration and grain size, the influence of the grain boundary scattering on electron transport weakens. The dominant scattering mechanism changes from grain boundary scattering to acoustic phonon scattering as temperature rises. The lattice thermal conductivity decreases with increasing Nb doping content due to the increased strain field fluctuations. These results provide an in-depth understanding of the transport mechanisms and guidance for further optimizing thermoelectric properties of half-Heusler alloys and other thermoelectric systems.
机译:在基于N-和P型(HF,ZR)的半空间器化合物中报道了高温ZT的高温ZT,并进一步提高了热电性能依赖于对电子和声子运输的富有洞察力的理解机制。在这项工作中,通过各种载流量分析(HF0.3ZR0.7)(1-x)Nbxcosb(x = 0.02-0.3)的热电传递特征。结果发现,尽管电荷传输的温度和能量依赖性类似于电离杂质散射,但晶界散射是在室温附近的主要散射机制。随着载流子浓度和晶粒尺寸的增加,晶界散射对电子传输的影响弱。随着温度升高,主导散射机构从晶界散射变为声学声子散射的变化。由于增加的应变场波动,晶格导热率随着Nb掺杂含量的增加而降低。这些结果提供了对传输机制和引导的深入理解,用于进一步优化半发生合金的热电性能和其他热电系统。

著录项

  • 来源
    《Advanced energy materials 》 |2019年第11期| 1803447.1-1803447.7| 共7页
  • 作者单位

    Zhejiang Univ State Key Lab Silicon Mat Hangzhou 310027 Zhejiang Peoples R China|Zhejiang Univ Sch Mat Sci & Engn Hangzhou 310027 Zhejiang Peoples R China;

    Zhejiang Univ State Key Lab Silicon Mat Hangzhou 310027 Zhejiang Peoples R China|Zhejiang Univ Sch Mat Sci & Engn Hangzhou 310027 Zhejiang Peoples R China;

    Zhejiang Univ State Key Lab Silicon Mat Hangzhou 310027 Zhejiang Peoples R China|Zhejiang Univ Sch Mat Sci & Engn Hangzhou 310027 Zhejiang Peoples R China;

    Zhejiang Univ State Key Lab Silicon Mat Hangzhou 310027 Zhejiang Peoples R China|Zhejiang Univ Sch Mat Sci & Engn Hangzhou 310027 Zhejiang Peoples R China;

    Zhejiang Univ State Key Lab Silicon Mat Hangzhou 310027 Zhejiang Peoples R China|Zhejiang Univ Sch Mat Sci & Engn Hangzhou 310027 Zhejiang Peoples R China;

    Zhejiang Univ State Key Lab Silicon Mat Hangzhou 310027 Zhejiang Peoples R China|Zhejiang Univ Sch Mat Sci & Engn Hangzhou 310027 Zhejiang Peoples R China;

    Zhejiang Univ State Key Lab Silicon Mat Hangzhou 310027 Zhejiang Peoples R China|Zhejiang Univ Sch Mat Sci & Engn Hangzhou 310027 Zhejiang Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    charge transport; grain boundary scattering; half-Heusler; thermoelectric materials; ZrCoSb;

    机译:电荷运输;晶界散射;半起点;热电材料;Zrcosb;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号