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首页> 外文期刊>Acta Polytechnica >Capillary Discharge XUV Radiation Source
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Capillary Discharge XUV Radiation Source

机译:毛细管放电XUV辐射源

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摘要

A device producing Z-pinching plasma as a source of XUV radiation is described. Here a ceramic capacitor bank pulse-charged up to 100 kV is discharged through a pre-ionized gas-filled ceramic tube 3.2 mm in diameter and 21 cm in length. The discharge current has amplitude of 20 kA and a rise-time of 65 ns. The apparatus will serve as experimental device for studying of capillary discharge plasma, for testing X-ray optics elements and for investigating the interaction of water-window radiation with biological samples. After optimization it will be able to produce 46.9 nm laser radiation with collision pumped Ne-like argon ions active medium.
机译:描述了一种产生Z-收缩等离子体作为XUV辐射源的设备。在这里,脉冲充电至100 kV的陶瓷电容器组通过直径为3.2 mm,长度为21 cm的预电离充气陶瓷管放电。放电电流的幅度为20 kA,上升时间为65 ns。该设备将用作研究毛细管放电等离子体,测试X射线光学元件以及研究水窗辐射与生物样品相互作用的实验装置。经过优化后,它将能够通过碰撞泵浦的类Ne氩离子活性介质产生46.9 nm的激光辐射。

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