Characterization of Nitride Thin Films Using SEM and EDX

摘要

The chromium nitride thin films have became more and more popular in the last years because of their very good physical, chemical and mechanical properties. The present study relates to thermal stability of hard thin films of chromium nitride CrN, carried out physical vapour deposition. We studied the influence of the annealing temperature on the morphology of CrN films, deposited on silicon substrate using magnetron sputtering. The characterizations are examined using scanning electron microscope equipped with energy dispersive X-ray spectroscopy. Annealing treatments in N_2 at 600-1000 ℃ for 1 h are performed on CrN coating samples for 530 nm thickness. At low temperature, the results show a thermal stability of these coatings. The Cr_2O_3 phase is completely replaced by the CrN phase at temperature above 1000 ℃. The results given by scanning electron microscopy-energy dispersive X-ray spectroscopy and X-ray diffraction are compared.