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Dipping Process Characteristics Based on Image Processing of Pictures Captured by High-speed Cameras

机译:基于高速相机拍摄图像的图像处理的浸渍过程特性

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摘要

The dipping process was recorded firstly by high-speed camera system; acceleration time, speed, and dipping time were set by the control system of dipping bed, respectively. By image processing of dipping process based on Otsu’s method, it was found that low-viscosity flux glue eliminates the micelle effectively, very low speed also leads to small micelle hidden between the bumps, and this small micelle and hidden phenomenon disappeared when the speed is ≥0.2 cm s−1. Dipping flux quantity of the bump decreases by about 100 square pixels when flux viscosity is reduced from 4,500 to 3,500 mpa s. For the 3,500 mpa s viscosity glue, dipping flux quantity increases with the increase of the speed and decreases with the increase of the speed after the speed is up to 0.8 cm s−1. The stable time of dipping glue can be obtained by real-time curve of dipping flux quantity and is only 80–90 ms when dipping speed is from 1.6 to 4.0 cm s−1. Dipping flux quantity has an increasing trend for acceleration time and has a decreasing trend for acceleration. Dipping flux quantity increases with the increase of dipping time, and is becoming saturated when the time is ≥55 ms.
机译:首先通过高速相机系统记录浸入过程;加速时间,速度和浸渍时间分别由浸渍床的控制系统设置。通过基于Otsu方法的浸渍工艺的图像处理,发现低粘度的助熔胶有效地消除了胶束,极低的速度也导致小胶束隐藏在凸块之间,当速度为0时,这种小胶束和隐藏现象消失了。 ≥0.2cms -1 。当助焊剂粘度从4,500 mpa降低到3,500 mpa时,凸点的浸渍助焊剂数量减少约100平方像素。对于3,500 mpa的粘度胶,在速度达到0.8 cm s -1 之后,浸渍通量随速度的增加而增加,而随着速度的增加而减少。浸渍胶的稳定时间可以通过浸渍流量的实时曲线获得,当浸渍速度为1.6至4.0 cmss -1 时仅为80-90毫秒。浸渍通量对于加速时间具有增加的趋势,而对于加速具有减小的趋势。浸渍磁通量随浸渍时间的增加而增加,并且当时间≥55ms时达到饱和。

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