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Design and Fabrication of CMOS Microstructures to Locally Synthesize Carbon Nanotubes for Gas Sensing

机译:CMOS微结构的设计和制造以本地合成用于气体传感的碳纳米管

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摘要

Carbon nanotubes (CNTs) can be grown locally on custom-designed CMOS microstructures to use them as a sensing material for manufacturing low-cost gas sensors, where CMOS readout circuits are directly integrated. Such a local CNT synthesis process using thermal chemical vapor deposition (CVD) requires temperatures near 900 °C, which is destructive for CMOS circuits. Therefore, it is necessary to ensure a high thermal gradient around the CNT growth structures to maintain CMOS-compatible temperature (below 300 °C) on the bulk part of the chip, where readout circuits are placed. This paper presents several promising designs of CNT growth microstructures and their thermomechanical analyses (by ANSYS Multiphysics software) to check the feasibility of local CNT synthesis in CMOS. Standard CMOS processes have several conductive interconnecting metal and polysilicon layers, both being suitable to serve as microheaters for local resistive heating to achieve the CNT growth temperature. Most of these microheaters need to be partially or fully suspended to produce the required thermal isolation for CMOS compatibility. Necessary CMOS post-processing steps to realize CNT growth structures are discussed. Layout designs of the microstructures, along with some of the microstructures fabricated in a standard AMS 350 nm CMOS process, are also presented in this paper.
机译:碳纳米管(CNT)可以在定制设计的CMOS微结构上本地生长,以将它们用作制造低成本气体传感器的传感材料,在该传感器中直接集成了CMOS读出电路。这种使用热化学气相沉积(CVD)的局部CNT合成工艺需要接近900°C的温度,这对CMOS电路具有破坏性。因此,有必要确保CNT生长结构周围的热梯度较高,以在放置读出电路的芯片主体上保持CMOS兼容温度(低于300°C)。本文介绍了几种有希望的CNT生长微结构设计及其热力学分析(通过ANSYS Multiphysics软件),以检查在CMOS中进行局部CNT合成的可行性。标准CMOS工艺具有多个导电互连金属层和多晶硅层,均适合用作局部电阻加热以实现CNT生长温度的微型加热器。这些微型加热器中的大多数都需要部分或完全悬挂,以产生CMOS兼容性所需的热隔离。讨论了实现CNT生长结构所需的CMOS后处理步骤。本文还介绍了微结构的布局设计,以及采用标准AMS 350 nm CMOS工艺制造的一些微结构。

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