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Toward Nanometer-Scale Optical Photolithography: Utilizing the Near-Field of Bowtie Optical Nanoantennas

机译:走向纳米级光学光刻:利用领结光学纳米天线的近场。

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摘要

Optically resonant metallic bowtie nanoantennas are utilized as fabrication tools for the first time, resulting in the production of polymer resist nanostructures <30 nm in diameter at record low incident multiphoton energy densities. The nanofabrication is accomplished via nonlinear photopolymerization, which is initiated by the enhanced, confined optical fields surrounding the nanoantenna. The position, size, and shape of the resist nanostructures directly correlate with rigorous finite-difference time-domain computations of the field distribution, providing a nanometer-scale measurement of the actual field confinement offered by single optical nanoantennas. In addition, the size of the photoresist regions yields strong upper bounds on photoacid diffusion and resist resolution in SU-8, demonstrating a technique that can be generalized to the study of many current and yet-to-be-developed photoresist systems.
机译:光学共振金属领结纳米天线首次被用作制造工具,从而以创纪录的低入射多光子能量密度产生直径小于30 nm的聚合物抗蚀剂纳米结构。纳米制造是通过非线性光聚合完成的,非线性光聚合是由围绕纳米天线的增强的,受限的光场引发的。抗蚀剂纳米结构的位置,大小和形状与场分布的严格有限时域计算直接相关,从而为单个光学纳米天线提供的实际场限制提供了纳米级测量。另外,光致抗蚀剂区域的尺寸在SU-8中产生了光酸扩散和抗蚀剂分辨率的强上限,这表明该技术可以推广到许多当前和尚待开发的光致抗蚀剂系统的研究中。

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